1. Description

CVD chemical vapor deposition furnace is an important process equipment for preparing carbon-carbon composites and completing CVD vapor deposition 

process.

2. Main parameters

1)Designed temperature：1250℃/1650℃/1800℃/2200℃

2)Working temperature：900~1200℃

3)Vacuum degree：＜50Pa

4)Pressure raising rate: 6.67Pa/h(or150Pa/24h) empty furnace, cold state

5)Heating method: Graphite resistance heating or induction heating

6)Gas medium: Nitrogen, natural gas or allylene, acetylene, hydrogen

7)Air control method: flow control

8)Furnace type: square, round, vertical or horizontal structure(non-standard type)

9)Other medium: furnace shell cooling water