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Vapor deposition furnace


1. Description

CVD chemical vapor deposition furnace is an important process equipment for preparing carbon-carbon composites and completing CVD vapor deposition 

process.


2. Main parameters

1)Designed temperature:1250℃/1650℃/1800℃/2200℃

2)Working temperature:900~1200℃

3)Vacuum degree:<50Pa

4)Pressure raising rate: 6.67Pa/h(or150Pa/24h) empty furnace, cold state

5)Heating method: Graphite resistance heating or induction heating

6)Gas medium: Nitrogen, natural gas or allylene, acetylene, hydrogen

7)Air control method: flow control

8)Furnace type: square, round, vertical or horizontal structure(non-standard type)

9)Other medium: furnace shell cooling water

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